James DeYoung

Applications of “Dry” Processing in the Microelectronics Industry Using Carbon Dioxide

Charles Jones, Amy E. Zweber, James DeYoung et al. · Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences · 2004 · 58 citations

Materials Science, Carbon Dioxide, Chemical Engineering +15

Etchant Solutions for the Removal of Cu(0) in a Supercritical CO₂-Based “Dry” Chemical Mechanical Planarization Process for Device Fabrication

Carol A. Bessel, Ginger M. Denison, Joseph M. DeSimone et al. · Journal of the American Chemical Society · 2003 · 51 citations

Materials Engineering, Materials Science, Chemical Engineering +14

HF Etchant Solutions in Supercritical Carbon Dioxide for “Dry” Etch Processing of Microelectronic Devices

Charles Jones, Dongxing Yang, E. A. Irene et al. · Chemistry of Materials · 2003 · 21 citations

Materials Science, Chemical Engineering, Engineering +15

Selective direct fluorination of organolithium and organomagnesium compounds

James DeYoung, Hajima Kawa, Richard J. Lagow · Journal of the Chemical Society Chemical Communications · 1992 · 21 citations

R. J. Lagow, J. Deyoung, Engineering +10

Nanoimprint System for High Volume Semiconductor Manufacturing; Requirement for Resist Materials

Toshiki Ito, Keiji Emoto, Tsuneo Takashima et al. · Journal of Photopolymer Science and Technology · 2016 · 14 citations · Full text

Engineering, Electron-beam Lithography, Pattern Transfer +22