Amy E. Zweber

Applications of “Dry” Processing in the Microelectronics Industry Using Carbon Dioxide

Charles Jones, Amy E. Zweber, James DeYoung et al. · Critical reviews in solid state and materials sciences/CRC critical reviews in solid state and materials sciences · 2004 · 58 citations

Materials Science, Carbon Dioxide, Chemical Engineering +15

Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication

Thomas Faure, Emily Gallagher, M. Hibbs et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 18 citations

Materials Science, Optical Engineering, Optical Materials +15

Impact of EUV photomask line-edge roughness on wafer prints

Zhengqing John Qi, Emily Gallagher, Yoshiyuki Negishi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 15 citations

Optical Engineering, Wafer Scale Processing, Engineering +15

Mechanism of Extreme Ultraviolet Photoresist Development with a Supercritical CO₂ Compatible Salt

Amy E. Zweber, Mark Wagner, James DeYoung et al. · Langmuir · 2009 · 13 citations