G. Gross

Projection maskless patterning for nanotechnology applications

Elmar Platzgummer, Hans Loeschner, G. Gross · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 22 citations

Engineering, Electron-beam Lithography, Microscopy +25

Ion projection lithography: Status of the MEDEA project and United States/European cooperation

G. Gross, Rainer Kaesmaier, Hans Löschner et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 16 citations

Optical Materials, Engineering, Electron-beam Lithography +23

Ion projection lithography: Next generation technology?

G. Gross · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 14 citations

Optical Materials, Engineering, Electron-beam Lithography +19

<i>p-n</i> junction-based wafer flow process for stencil mask fabrication

Ivo W. Rangelow, F.G. Shi, B. Volland et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 13 citations

Materials Science, Electrical Engineering, Wafer Scale Processing +15

Ion projection lithography

J. Melngailis, Hans Löschner, G. Stengl et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1998 · 12 citations

Engineering, Electron-beam Lithography, Microscopy +17