Rainer Kaesmaier

Measuring acid generation efficiency in chemically amplified resists with all three beams

Charles R. Szmanda, Robert L. Brainard, Joseph F. Mackevich et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 45 citations

Chemical Engineering, Electrical Engineering, Engineering +15

Ion projection lithography: International development program

Rainer Kaesmaier, Hans Löschner, G. Stengl et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 31 citations

Electrical Engineering, Wafer Scale Processing, Engineering +15

<title>Overview of the ion projection lithography European MEDEA and international program</title>

Rainer Kaesmaier, Hans Loeschner · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 19 citations

Ion projection lithography: Status of the MEDEA project and United States/European cooperation

G. Gross, Rainer Kaesmaier, Hans Löschner et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 16 citations

Optical Materials, Engineering, Electron-beam Lithography +23

Characterization of a process development tool for ion projection lithography

Hans Loeschner, G. Stengl, Rainer Kaesmaier et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 14 citations

Engineering, Electron-beam Lithography, Microscopy +21