Sebastian Naczas

High performance extremely thin SOI (ETSOI) hybrid CMOS with Si channel NFET and strained SiGe channel PFET

K. Cheng, A. Khakifirooz, N. Loubet et al. · 2012 · 74 citations

Engineering, Computer Engineering, Electrical Engineering +17

Strain engineered extremely thin SOI (ETSOI) for high-performance CMOS

A. Khakifirooz, Kangguo Cheng, Toshiharu Nagumo et al. · 2012 · 36 citations

Engineering, Electrical Engineering, Materials Science +15

Fabrication of surface textures by ion implantation for antireflection of silicon crystals

Nirag Kadakia, Sebastian Naczas, H. Bakhru et al. · Applied Physics Letters · 2010 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +17

ETSOI CMOS for system-on-chip applications featuring 22nm gate length, sub-100nm gate pitch, and 0.08µm 2 SRAM cell

Kangguo Cheng, A. Khakifirooz, P. Kulkarni et al. · 2011 · 19 citations

Engineering, Computer Engineering, Electrical Engineering +16

Bottom oxidation through STI (BOTS) — A novel approach to fabricate dielectric isolated FinFETs on bulk substrates

Kangguo Cheng, Soon‐Cheon Seo, J. Faltermeier et al. · 2014 · 17 citations

Engineering, Electrical Engineering, Materials Science +11