C. Tian

High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography

P. Agnello, T. Ivers, C. Warm et al. · 2006 · 115 citations

Engineering, Vlsi Design, Enhanced Strain +21

Optical properties of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mi>δ</mml:mi></mml:math>-doped ZnSe:Te grown by molecular beam epitaxy: The role of tellurium

Igor L. Kuskovsky, C. Tian, G. F. Neumark et al. · Physical review. B, Condensed matter · 2001 · 45 citations

High performance bulk planar 20nm CMOS technology for low power mobile applications

Huiling Shang, S. Jain, E. Josse et al. · 2012 · 26 citations

Low-power Electronics, High Density, Electrical Engineering +14

High crystalline quality ZnBeSe grown by molecular beam epitaxy with Be–Zn co-irradiation

Shiping Guo, Yuhao Luo, W. Lin et al. · Journal of Crystal Growth · 2000 · 24 citations

Materials Science, Ii-vi Semiconductor, Engineering +6

A 45 nm CMOS node Cu/Low-k/ Ultra Low-k PECVD SiCOH (k=2.4) BEOL Technology

S. Sankaran, S. Arai, R. Augur et al. · 2006 · 22 citations

Materials Science, Materials Engineering, Electrical Engineering +15