Investigation of abnormally high growth-per-cycle in atomic layer deposition of Al2O3 using trimethylaluminum and water

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

A. W. Ott, J. W. Klaus, J. M. Johnson et al. · Thin Solid Films · 1997 · 512 citations

Natural Sciences, Chemistry, Materials Science +14

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Anne C. Dillon, A. W. Ott, J. Douglas Way et al. · Surface Science · 1995 · 459 citations

Natural Sciences, Materials Engineering, Materials Science +15

Al₂O₃ Atomic Layer Deposition with Trimethylaluminum and Ozone Studied by in Situ Transmission FTIR Spectroscopy and Quadrupole Mass Spectrometry

David N. Goldstein, Jarod A. McCormick, Steven M. George · The Journal of Physical Chemistry C · 2008 · 325 citations

Natural Sciences, Materials Engineering, Materials Science +15

Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates

Dennis M. Hausmann, Jill Becker, Shenglong Wang et al. · Science · 2002 · 228 citations

Natural Sciences, Materials Engineering, Materials Science +17

Interface engineering and chemistry of Hf-based high-k dielectrics on III–V substrates

Gang He, Zhaoqi Sun · Surface Science Reports · 2013 · 208 citations

Natural Sciences, Materials Engineering, Materials Science +14