A. W. Ott

Surface Chemistry for Atomic Layer Growth

Steven M. George, A. W. Ott, J. W. Klaus · The Journal of Physical Chemistry · 1996 · 669 citations

Materials Science, Engineering, Surface Chemistry +12

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

A. W. Ott, J. W. Klaus, J. M. Johnson et al. · Thin Solid Films · 1997 · 508 citations

Materials Science, Aluminium Nitride, Chemical Engineering +8

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Anne C. Dillon, A. W. Ott, J. Douglas Way et al. · Surface Science · 1995 · 458 citations

Materials Science, Aluminium Nitride, Chemical Engineering +12

A 65nm logic technology featuring 35nm gate lengths, enhanced channel strain, 8 Cu interconnect layers, low-k ILD and 0.57 μm/sub 2/ SRAM cell

Peng Bai, C. Auth, S. Balakrishnan et al. · 2005 · 230 citations

Electrical Engineering, Physical Design (Electronics), Engineering +15

Atomic layer-controlled growth of transparent conducting ZnO on plastic substrates

A. W. Ott, Robert P. H. Chang · Materials Chemistry and Physics · 1999 · 153 citations

Materials Science, Engineering, Nanotechnology +6