J. W. Klaus

Surface Chemistry for Atomic Layer Growth

Steven M. George, A. W. Ott, J. W. Klaus · The Journal of Physical Chemistry · 1996 · 669 citations

Materials Science, Engineering, Surface Chemistry +12

A 90-nm logic technology featuring strained-silicon

Scott E. Thompson, M Armstrong, C. Auth et al. · IEEE Transactions on Electron Devices · 2004 · 654 citations

Electrical Engineering, Engineering, Nanoelectronics +10

A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

T. Ghani, M Armstrong, C. Auth et al. · 2004 · 559 citations

Silicon Cmos Transistors, Engineering, High Volume +17

A Logic Nanotechnology Featuring Strained-Silicon

Scott E. Thompson, M Armstrong, C. Auth et al. · IEEE Electron Device Letters · 2004 · 511 citations

Electrical Engineering, Engineering, Flexible Electronics +12

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

A. W. Ott, J. W. Klaus, J. M. Johnson et al. · Thin Solid Films · 1997 · 508 citations

Materials Science, Aluminium Nitride, Chemical Engineering +8