J. W. Klaus

Surface Chemistry for Atomic Layer Growth

Steven M. George, A. W. Ott, J. W. Klaus · The Journal of Physical Chemistry · 1996 · 676 citations

Natural Sciences, Chemistry, Materials Science +17

A 90-nm logic technology featuring strained-silicon

Scott E. Thompson, M Armstrong, C. Auth et al. · IEEE Transactions on Electron Devices · 2004 · 666 citations

Engineering, Electrical Engineering, Materials Science +17

A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

T. Ghani, M Armstrong, C. Auth et al. · 2004 · 561 citations

Engineering, Computer Engineering, Electrical Engineering +17

A Logic Nanotechnology Featuring Strained-Silicon

Scott E. Thompson, M Armstrong, C. Auth et al. · IEEE Electron Device Letters · 2004 · 513 citations

Engineering, Electrical Engineering, Materials Science +17

Al3O3 thin film growth on Si(100) using binary reaction sequence chemistry

A. W. Ott, J. W. Klaus, J. M. Johnson et al. · Thin Solid Films · 1997 · 512 citations

Natural Sciences, Chemistry, Materials Science +14