Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H2 plasma

Optical Properties and Electronic Structure of Amorphous Germanium

J. Tauc, R. Grigorovici, A. Vancu · physica status solidi (b) · 1966 · 10.7K citations

Natural Sciences, Materials Science, Physics +17

Practical surface analysis

Vacuum · 1994 · 3.3K citations

Practical surface analysis

E. Umbach · TrAC Trends in Analytical Chemistry · 1992 · 2.5K citations

The hydrogen content of plasma-deposited silicon nitride

W. A. Lanford, Myron J. Rand · Journal of Applied Physics · 1978 · 782 citations

Natural Sciences, Chemistry, Materials Science +17

Low-temperature reactive ion etching and microwave plasma etching of silicon

S. Tachi, Kazunori Tsujimoto, Sadayuki Okudaira · Applied Physics Letters · 1988 · 333 citations

Engineering, Materials Engineering, Materials Science +16