Vapor Phase Etching

Vapor Phase Etching is a dry etching process in semiconductor manufacturing that uses gaseous chemicals to selectively remove material from a substrate surface through chemical reactions in the vapor phase.

98

Publications

3.9K

Citations

363

Authors

107

Institutions

Publications per year

2017–2026

11

Variants

Vpe

Authors

363

  1. MS
    M. Saadoun

    Research and Technology Center of Energy, Tunisia

    3 publications · 120 citations

    3

    h-index

  2. BB
    B. Bessaı̈s

    Research and Technology Center of Energy, Tunisia

    3 publications · 120 citations

    3

    h-index

  3. SK
    S. K. Ghandhi

    Rensselaer Polytechnic Institute, United States

    3 publications · 69 citations

    3

    h-index

  4. HC
    Harish C. Barshilia

    National Aerospace Laboratories, India

    2 publications · 45 citations

    2

    h-index

  5. RB
    R. Bhat

    Core Competence, United States

    2 publications · 49 citations

    2

    h-index

1–5 of 363

Venues

  1. Journal of The Electrochemical Society

    JES · 21 publications · 612 citations

    15

    h-index

  2. Journal of Crystal Growth

    11 publications · 180 citations

    10

    h-index

  3. Journal of Applied Physics

    5 publications · 187 citations

    5

    h-index

  4. Journal of Microelectromechanical Systems

    5 publications · 226 citations

    5

    h-index

  5. Thin Solid Films

    4 publications · 146 citations

    4

    h-index

1–5