Vapor Phase Etching
Vapor Phase Etching is a dry etching process in semiconductor manufacturing that uses gaseous chemicals to selectively remove material from a substrate surface through chemical reactions in the vapor phase.
98
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3.9K
Citations
363
Authors
107
Institutions
Publications per year
2017–2026
11
Variants
Vpe
Parents
98
Characterization of threading dislocations in GaN epitaxial layers
T. Hino, Shigetaka Tomiya, T. Miyajima et al. · Applied Physics Letters · 2000 · 400 citations
Motoaki Iwaya, Tetsuya Takeuchi, Shigeo Yamaguchi et al. · Japanese Journal of Applied Physics · 1998 · 192 citations
Bioceramics for implant coatings
Allison A. Campbell · Materials Today · 2003 · 141 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +17
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AT&T (United States)
Bedminster, United States
4 h-index
21 publications
479 citations
Research and Technology Center of Energy
Hammam-Lif, Tunisia
3 h-index
12 publications
164 citations
Texas Instruments (United States)
Dallas, United States
3 h-index
7 publications
170 citations
Rensselaer Polytechnic Institute
Troy, United States
2 h-index
5 publications
124 citations
Corning (United States)
Corning, United States
2 h-index
4 publications
81 citations
The University of Tokyo
Tokyo, Japan
2 h-index
10 publications
315 citations
Electronics and Telecommunications Research Institute
Daejeon, South Korea
2 h-index
7 publications
626 citations

Pennsylvania State University
State College, United States
2 h-index
7 publications
399 citations
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JES · 21 publications · 612 citations
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11 publications · 180 citations
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5 publications · 187 citations
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5 publications · 226 citations
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4 publications · 146 citations
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