IEEE Electron Device Letters · 2019 · 159 citations · 32 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDopingHigh-frequency Semiconductor DevicesMetal-oxide-semiconductor Field-effect TransistorsWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsCurrent GainDelta DopingGallium OxideHigh-frequency ElectronicsHigh-frequency OperationHigh-frequency PerformanceOptoelectronic PropertiesWide-bandgap Oxides
As an ultra-wide bandgap semiconductor, β-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> has attracted great attention for high-power, high-voltage, and optoelectronic applications. However, until now, high-frequency performance of gallium oxide devices has been limited to relatively low current gain cutoff frequencies below 5 GHz. Here, we show that highly localized delta-doping designs can enable high-sheet-charge density to enable devices with short gate lengths that allow high-frequency operation. Field-effect transistors with a gate length of 120 nm on such delta-doped β-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> are reported here with extrinsic unity current gain frequency of 27 GHz. The device has a peak drain current of 260 mA/mm, transconductance (gm) of 44 mS/mm, and three-terminal off-state breakdown voltage of 150 V. These results demonstrate that the potential of β-Ga <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> for future RF and millimeter-wave device applications.
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Large-size β-Ga2O3 single crystals and wafers
Encarnación G. Vı́llora, Kiyoshi Shimamura, Yukio Yoshikawa et al. · Journal of Crystal Growth · 2004 · 633 citations
Natural Sciences, Materials Engineering, Materials Science +12
1-kV vertical Ga2O3 field-plated Schottky barrier diodes
Keita Konishi, Ken Goto, Hisashi Murakami et al. · Applied Physics Letters · 2017 · 576 citations