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Nitrogen vacancies as a common element of the green luminescence and nonradiative recombination centers in Mg-implanted GaN layers formed on a GaN substrate
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Citations
37
References
2017
Year
Materials EngineeringMaterials ScienceElectrical EngineeringGan SubstratePoint DefectsEpitaxial Mg-doped GanPhysicsGreen LuminescenceNitrogen VacanciesEngineeringPhotoluminescenceApplied PhysicsAluminum Gallium NitrideGan Power DeviceGallium OxideCategoryiii-v SemiconductorOptoelectronicsWide-bandgap Semiconductor
The photoluminescences of ion-implanted (I/I) and epitaxial Mg-doped GaN (GaN:Mg) are compared. The intensities and lifetimes of the near-band-edge and ultraviolet luminescences associated with a MgGa acceptor of I/I GaN:Mg were significantly lower and shorter than those of the epilayers, respectively. Simultaneously, the green luminescence (GL) became dominant. These emissions were quenched far below room temperature. The results indicate the generation of point defects common to GL and nonradiative recombination centers (NRCs) by I/I. Taking the results of positron annihilation measurement into account, N vacancies are the prime candidate to emit GL and create NRCs with Ga vacancies, (VGa)m(VN)n, as well as to inhibit p-type conductivity.
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