IEEE Journal of Quantum Electronics · 1999 · 52 citations · 26 references
Natural SciencesPhysicsOpticsPhotonicsRadiation PhysicsX-ray OpticsX-ray SpectroscopyCoherence LengthElectromagnetic SpectrumExtreme Ultraviolet EmissionExtreme Ultraviolet SpectroscopyPinhole OpticsRelativistic Electron BeamsSoft X-ray OpticsX-ray Monochromators
Undulator radiation, generated by relativistic electrons traversing a periodic magnet structure, can provide a continuously tunable source of very bright and partially coherent radiation in the extreme ultraviolet (EUV), soft X-ray (SXR), and X-ray regions of the electromagnetic spectrum. Typically, 1-10 W are radiated within a 1/N relative spectral bandwidth, where N is of order 100. Monochromators are frequently used to narrow the spectral bandwidth and increase the longitudinal coherence length, albeit with a more than proportionate loss of power. Pinhole spatial filtering is employed to provide spatially coherent radiation at a power level determined by the wavelength, electron beam, and undulator parameters. In this paper, experiments are described in which broadly tunable, spatially coherent power is generated at EUV and soft X-ray wavelengths extending from about 3 to 16 nm (80-430-eV photon energies). Spatially coherent power of order 10 /spl mu/W is achieved in a relative spectral bandwidth of 9/spl times/10/sup -4/, with 1.90-GeV electrons traversing an 8-cm period undulator of 55 periods. This radiation has been used in 13.4-nm interferometric tests that achieve an rms wavefront error (departure from sphericity) of /spl lambda//sub euv//330. These techniques scale in a straightforward manner to shorter soft X-ray wavelengths using 4-5-cm period undulators at 1.90 GeV and to X-ray wavelengths of order 0.1 nm using higher energy (6-8 GeV) electron beams at other facilities.
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Characteristics of synchrotron radiation
Kwang-Je Kim · AIP conference proceedings · 1989 · 219 citations
Natural Sciences, Astronomy, Physics +10
Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm
J. E. Bjorkholm, Jeffrey Bokor, L. Eichner et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 158 citations
Natural Sciences, Materials Engineering, Materials Science +15
Phase-shifting point diffraction interferometer
H. Medecki, Edita Tejnil, Kenneth A. Goldberg et al. · Optics Letters · 1996 · 147 citations