L. Eichner

Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm

J. E. Bjorkholm, Jeffrey Bokor, L. Eichner et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1990 · 158 citations

Optical Materials, X-ray Spectroscopy, Engineering +23

Soft-x-ray projection lithography: printing of 02-μm features using a 20:1 reduction

Dwight W. Berreman, John H. Bruning, J. E. Bjorkholm et al. · Optics Letters · 1990 · 33 citations

Reflective mask technologies and imaging results in soft x-ray projection lithography

D. M. Tennant, J. E. Bjorkholm, Raissa M. D’Souza et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1991 · 23 citations

Optical Materials, Engineering, Electron-beam Lithography +22

Use of trilevel resists for high-resolution soft-x-ray projection lithography

Dwight W. Berreman, J. E. Bjorkholm, Marco Becker et al. · Applied Physics Letters · 1990 · 19 citations · Full text

Optical Materials, Engineering, Electron-beam Lithography +16

Direct writing in self-developing resists using low-power cw ultraviolet light

J. E. Bjorkholm, L. Eichner, J. C. White et al. · Journal of Applied Physics · 1985 · 17 citations

Engineering, Electron-beam Lithography, Microscopy +19