1973 · 15 citations · 3 references
EngineeringElectrical EngineeringElectronic MaterialsMicroelectronicsSemiconductor DevicesChannel StructureIntegrated Circuit DesignIon ChannelsIon ImplantationShort-channel EffectsChannel EngineeringGate Oxide Thickness EffectsIon Implantation Effects
3
Design of micron MOS switching devices
R.H. Dennard, F.H. Gaensslen, L. Kuhn et al. · 1972 · 113 citations