IEEE Electron Device Letters · 2000 · 16 citations · 13 references
EngineeringElectrical EngineeringPhysicsElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsDopingP-n JunctionsSemiconductor DefectsSemiconductor Device MaterialsWide Band Gap SemiconductorsWide-bandgap Semiconductor DevicesElectron Impact IonizationElectron IonizationHeterojunction Bipolar TransistorsP-type Doping
The electric field dependence of the hole impact ionization coefficients in Ga/sub 0.47/In/sub 0.53/As and Ga/sub 0.28/In/sub 0.72/As/sub 0.61/P/sub 0.39/ was obtained from the electrical characteristics of p-n-p heterojunction bipolar transistors. The anomalous low field behavior of the electron impact ionization coefficients in these materials was not observed for the case of holes. Within the accuracy of our measurements me observed no change in the hole ionization rates in the temperature range of 20 to 120/spl deg/C.
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Thresholds of impact ionization in semiconductors
J. Bude, K. Hess · Journal of Applied Physics · 1992 · 195 citations
Temperature dependence of impact ionization coefficients in InP
K. Taguchi, T. Torikai, Yoshimasa Sugimoto et al. · Journal of Applied Physics · 1986 · 58 citations