Dependency analysis of line edge roughness in electron-beam lithography

CASINO V2.42—A Fast and Easy‐to‐use Modeling Tool for Scanning Electron Microscopy and Microanalysis Users

Dominique Drouin, Alexandre Réal Couture, Dany Joly et al. · Scanning · 2007 · 1.5K citations

Engineering, Electrical Engineering, Materials Science +13

Proximity effect correction for electron beam lithography by equalization of background dose

G. Owen, Paul Rissman · Journal of Applied Physics · 1983 · 114 citations

Medicine, Electrical Engineering, Radiation Dosimetry +14

Fabrication of 3D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow

Arne Schleunitz, Helmut Schift · Journal of Micromechanics and Microengineering · 2010 · 95 citations

Engineering, Materials Engineering, Materials Science +10

Local critical dimension variation from shot-noise related line edge roughness

P. Kruit, S. W. H. K. Steenbrink · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 51 citations

Engineering, Electrical Engineering, Materials Science +17

Finite element simulation of a stress history during the manufacturing process of thin film stacks in VLSI structures

J. Lee, Anne Sauter Mack · IEEE Transactions on Semiconductor Manufacturing · 1998 · 49 citations

Engineering, Electrical Engineering, Materials Science +17