Chan-Uk Jeon

SEMATECH's EUV program: a key enabler for EUVL introduction

Stefan Wurm, Chan-Uk Jeon, Michael J. Lercel · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 27 citations

Engineering, Electrical Engineering, Materials Engineering +8

A fast path-based method for 3-D resist development simulation

Qing Dai, Rui Guo, Soo-Young Lee et al. · Microelectronic Engineering · 2014 · 22 citations

Engineering, Computational Engineering, Electrical Engineering +10

Study of nanometer-thick graphite film for high-power EUVL pellicle

Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +6

Inspection with the Lasertec M7360 at the SEMATECH Mask Blank Development Center

Patrick A. Kearney, Eric M. Gullikson, Anwei Jia et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 11 citations

Engineering, Materials Engineering, Materials Science +17

Dependency analysis of line edge roughness in electron-beam lithography

Xunwang Zhao, Soo-Young Lee, Soo-Young Lee et al. · Microelectronic Engineering · 2014 · 11 citations

Engineering, Materials Engineering, Materials Science +14