2009 · 121 citations · 5 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsMetallic MaterialsSemiconductor DevicesIntegrated Circuit DesignIntegrated Circuit DevicesIntegrated Circuit FabricationInterconnect DesignInterconnect Technology3D Integrated CircuitsContact ResistanceCopper InterconnectsDual Damascene ProcessInterconnect FabricationThree-dimensional Integrated Circuit InterconnectsThree-dimensional Integrated Circuit LayoutThree-dimensional Integration
This paper presents preliminary results of a copper-based direct bond interconnect (DBIreg) 3D integration process that has been developed to leverage foundry standard copper dual damascene and Ziptronix bond technology to achieve scalable, very low Cost-of-Ownership, 3D interconnects with minimum foundry adoption barrier. Results achieved include 100% operable arrays of 72,500 3D copper DBIreg interconnections on a 25 micron pitch with a 125degC thermal budget and 10 micron pitch 3D copper DBIreg interconnections with a 350degC thermal budget. DBIreg contact resistance and resistivity achieved are < 50 mOhm / connection and < 0.45 Ohm-um <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , respectively, using three or four micron diameter Cu DBIreg plugs and a TiW barrier layer. Reliability results include bare die that pass temperature cycling and HAST JEDEC tests.
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Room temperature metal direct bonding
Qiaoling Tong · Applied Physics Letters · 2006 · 49 citations
Copper direct bonding: An innovative 3D interconnect
Pierric Gueguen, L. Di Cioccio, P. Morfouli et al. · 2010 · 34 citations
P.M. Enquist · Materials Research Society Symposium Proceedings · 2008 · 19 citations