Contact Resistance

Contact Resistance is the electrical resistance arising at the interface between two conductive materials, distinguished from bulk resistance by its dependence on surface conditions, interfacial morphology, and the nature of the junction, including effects such as oxide layers, contamination, and pressure-induced contact area in electronic, microelectromechanical, and welding systems.

6.3K

Publications

309.7K

Citations

21.5K

Authors

2.7K

Institutions

Publications per year

2017–2026

1.6K

Authors

21.5K

  1. SJ
    S. J. Pearton

    University of Florida, United States

    39 publications · 1.7K citations

    23

    h-index

  2. TS
    Tae‐Yeon Seong

    Korea University, South Korea

    34 publications · 1.6K citations

    23

    h-index

  3. FR
    F. Ren

    University of Florida, United States

    35 publications · 1.6K citations

    22

    h-index

  4. KT
    Kazuhito Tsukagoshi

    National Institute for Materials Science, Japan

    29 publications · 1.8K citations

    22

    h-index

  5. KW
    Kenji Watanabe

    National Institute for Materials Science, Japan

    21 publications · 1.6K citations

    19

    h-index

1–5 of 21.5K

Venues

  1. Applied Physics Letters

    566 publications · 31.7K citations

    86

    h-index

  2. Journal of Applied Physics

    341 publications · 25K citations

    63

    h-index

  3. ACS Nano

    80 publications · 10.5K citations

    55

    h-index

  4. IEEE Transactions on Electron Devices

    222 publications · 9.4K citations

    47

    h-index

  5. Journal of The Electrochemical Society

    JES · 155 publications · 9.5K citations

    47

    h-index

1–5