A general semiconductor press modeling framework

Abstract

A general semiconductor process modeling framework is presented. The framework encompasses, first, a methodology for the description of any manufacturing process using state and state transformation information and, second, a conceptual process model that distinguishes between and defines terms for the state information and state transformations involved in integrated circuit fabrication. This modeling methodology and conceptual semiconductor process model aid in the understanding of fabrication processes, provide a formalism for the description of processes, help to guide the development of process flow languages and representations, and support a number of process-related activities, including process design and process control.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>