Improvement in dielectric properties of low temperature PECVD silicon dioxide by reaction with hydrazine - Concepedia

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Improvement in dielectric properties of low temperature PECVD silicon dioxide by reaction with hydrazine

16

Citations

10

References

1995

Year

Kirkland W. Vogt, M.R. Houston, M. F. Ceiler, Catherine Roberts, Paul A. Kohl

Journal of Electronic Materials

Materials ScienceDielectric PropertiesChemical EngineeringMaterials EngineeringEngineering

References

	Year	Citations

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