Concepedia

M. F. Ceiler

MF

Statistics

Publications

3

Citations

178

H-Index

3

Active since

1994

Affiliations

Georgia Institute of Technology(Current)

M. F. Ceiler is an author at Georgia Institute of Technology specializing in engineering, materials engineering, and chemical engineering.

Top concepts

EngineeringThin FilmsApplied PhysicsSurface ScienceMaterial ScienceChemical EngineeringMaterials EngineeringElectrical EngineeringPhotovoltaicsMicroelectronics

Publications per year

1994–1995

3

Publications

3

Plasma‐Enhanced Chemical Vapor Deposition of Silicon Dioxide Deposited at Low Temperatures

M. F. Ceiler, Paul A. Kohl, Sue Ann Bidstrup · Journal of The Electrochemical Society · 1995 · 118 citations

Engineering, Thin Film Process Technology, Chemical Deposition +19

Modeling the properties of PECVD silicon dioxide films using optimized back-propagation neural networks

Seung-Soo Han, M. F. Ceiler, Sue Ann Bidstrup et al. · IEEE Transactions on Components Packaging and Manufacturing Technology Part A · 1994 · 44 citations

Materials Engineering, Electrical Engineering, Engineering +13

Improvement in dielectric properties of low temperature PECVD silicon dioxide by reaction with hydrazine

Kirkland W. Vogt, M.R. Houston, M. F. Ceiler et al. · Journal of Electronic Materials · 1995 · 16 citations

Materials Science, Dielectric Properties, Chemical Engineering +2

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