Highly selective SiO2/Si reactive ion beam etching withlow energy fluorocarbon ions

Plasma etching—A discussion of mechanisms

J. W. Coburn, Harold F. Winters · Journal of Vacuum Science and Technology · 1979 · 601 citations

Natural Sciences, Chemistry, Materials Science +15

Silicon etching mechanisms in a CF4/H2 glow discharge

G. S. Oehrlein, Holly Williams · Journal of Applied Physics · 1987 · 158 citations

Natural Sciences, Materials Engineering, Materials Science +17

Simulation of plasma-assisted etching processes by ion-beam techniques

T. M. Mayer, R. A. Barker · Journal of Vacuum Science and Technology · 1982 · 126 citations

Natural Sciences, Materials Science, Physics +17

Chemical sputtering of silicon by F+, Cl+, and Br+ ions: Reactive spot model for reactive ion etching

S. Tachi, Sadayuki Okudaira · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1986 · 107 citations

Natural Sciences, Chemistry, Materials Science +13

A study of CClF3/H2 reactive ion etching damage and contamination effects in silicon

X. C. Mu, S.J. Fonash, G. S. Oehrlein et al. · Journal of Applied Physics · 1986 · 49 citations

Engineering, Materials Engineering, Materials Science +17