X. C. Mu

A study of CClF3/H2 reactive ion etching damage and contamination effects in silicon

X. C. Mu, S.J. Fonash, G. S. Oehrlein et al. · Journal of Applied Physics · 1986 · 49 citations

Materials Science, Cclf3/h2 Reactive Ion, Chemical Engineering +15

Comparison of the damage and contamination produced by CF4 and CF4/H2 reactive ion etching: The role of hydrogen

X. C. Mu, S.J. Fonash, A. Rohatgi et al. · Applied Physics Letters · 1986 · 38 citations

Materials Science, Environmental Chemistry, Chemical Engineering +14

Observation of boron acceptor neutralization in silicon produced by CF4 reactive ion etching or Ar ion beam etching

X. C. Mu, S.J. Fonash, Ranbir Singh · Applied Physics Letters · 1986 · 33 citations

Engineering, Chemistry, Silicon On Insulator +17

High-barrier Schottky diodes on p-type silicon due to dry-etching damage

X. C. Mu, S.J. Fonash · IEEE Electron Device Letters · 1985 · 30 citations

Engineering, Optoelectronic Devices, Integrated Circuits +17

A study of contamination and damage on Si surfaces induced by dry etching

Farhad Moghadam, X. C. Mu · IEEE Transactions on Electron Devices · 1989 · 28 citations

Materials Science, Electrical Engineering, Engineering +15