X. C. Mu - Concepedia

Author

X. C. Mu

Pennsylvania State University

Also Known As

X. C. Mu, X. Chun Mu, X.-C. Mu, X.C. Mu, Xianfeng Mu, Xichen Mu

Publications

277

Citations

H-Index

Concepts

All Affiliations

Pennsylvania State University Westinghouse Electric (United States)

About

X. C. Mu is an author at Pennsylvania State University specializing in engineering, applied physics, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	249
2	Applied Physics	8	8	225
3	Chemical Engineering	4	4	131
4	Chemistry	3	3	82
5	Natural Sciences	1	1	33

X. C. Mu

Publications

249

Citations

H-Index

Page 1

	Year	Citations
A study of CClF3/H2 reactive ion etching damage and contamination effects in silicon X. C. Mu, S.J. Fonash, G. S. Oehrlein, Journal of Applied Physics Materials ScienceCclf3/h2 Reactive IonChemical EngineeringIon ImplantationEngineering	1986	49
Comparison of the damage and contamination produced by CF4 and CF4/H2 reactive ion etching: The role of hydrogen X. C. Mu, S.J. Fonash, A. Rohatgi, Applied Physics Letters Materials ScienceEnvironmental ChemistryChemical EngineeringOwn DamageEtched Silicon	1986	38
Observation of boron acceptor neutralization in silicon produced by CF4 reactive ion etching or Ar ion beam etching X. C. Mu, S.J. Fonash, Ranbir Singh Applied Physics Letters EngineeringChemistrySilicon On InsulatorPlasma ProcessingChemical Engineering	1986	33
High-barrier Schottky diodes on p-type silicon due to dry-etching damage X. C. Mu, S.J. Fonash IEEE Electron Device Letters EngineeringOptoelectronic DevicesIntegrated CircuitsSilicon On InsulatorSemiconductor Device	1985	30
A study of contamination and damage on Si surfaces induced by dry etching Farhad Moghadam, X. C. Mu IEEE Transactions on Electron Devices Materials ScienceElectrical EngineeringEngineeringMicrofabricationSurface Science	1989	28
Advanced energy management and optimal scheduling for integrated offshore gas-hydrogen-electricity-heat systems Zhe Wang, X. C. Mu, Yuhao Ma, Energy Optimal SchedulingEngineeringEnergy AnalysisHydrogen-based MicrogridsEnergy Efficiency	2025	24
Ar ion beam and CCl4 reactive ion etching: A comparison of etching damage and of damage passivation by hydrogen X. C. Mu, Stephen J. Fonash, Bing-Chwen Yang, Journal of Applied Physics EngineeringSingle-crystal SiliconSilicon On InsulatorH+ ImplantsIon Implantation	1985	23
A study of target heating in low-energy ion-beam processing S. A. Ringel, X. C. Mu, Stephen J. Fonash, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceTarget HeatingEngineeringHigh Temperature MaterialsLow‐energy Ion‐beam Processing	1986	13
An X‐Ray Photoelectron Spectroscopy Study of CF 4 / H 2 Reactive Ion Etching Residue on Silicon J. H. Thomas, X. C. Mu, Stephen J. Fonash Journal of The Electrochemical Society Materials ScienceChemical EngineeringOxide‐coated Silicon SurfaceEngineeringCf 4	1987	11

Page 1