Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films

Determination of the thickness and optical constants of amorphous silicon

R. Swanepoel · Journal of Physics E Scientific Instruments · 1983 · 3.9K citations

Natural Sciences, Materials Engineering, Materials Science +17

Hafnia and hafnia-toughened ceramics

J. Wang, H. P. Li, R. Stevens · Journal of Materials Science · 1992 · 584 citations

Natural Sciences, Materials Engineering, Materials Science +12

Growth of titanium dioxide thin films by atomic layer epitaxy

Mikko Ritala, Markku Leskelä, E. Nykänen et al. · Thin Solid Films · 1993 · 307 citations

Natural Sciences, Materials Engineering, Materials Science +14

Morphology and structure of TiO2 thin films grown by atomic layer deposition

Jaan Aarik, Aleks Aidla, Teet Uustare et al. · Journal of Crystal Growth · 1995 · 302 citations

Natural Sciences, Materials Engineering, Materials Science +14

An IR and NMR study of the chemisorption of titanium tetrachloride on silica

Suvi Haukka, Eeva Liisa Lakomaa, Andrew Root · The Journal of Physical Chemistry · 1993 · 273 citations

Natural Sciences, Chemistry, Materials Science +7