Trap-assisted tunneling in high permittivity gate dielectric stacks

Michel Houssa, M. Tuominen, M. Naili, +4

Journal of Applied Physics

SemiconductorsTrap-assisted TunnelingElectrical EngineeringSemiconductor TechnologyZro2 Stack +11

An IR and NMR study of the chemisorption of titanium tetrachloride on silica

Suvi Haukka, Eeva Liisa Lakomaa, Andrew Root

The Journal of Physical Chemistry

EngineeringChemical AnalysisAltmetric Attention ScoreOrganic ChemistryChemistry +14

Electrical and materials properties of ZrO2 gate dielectrics grown by atomic layer chemical vapor deposition

C. Perkins, B. B. Triplett, Paul C. McIntyre, +3

Applied Physics Letters

Zro2 DielectricsEngineeringThin Film Process TechnologyZro2 FilmsSemiconductors +16

The reaction of hexamethyldisilazane and subsequent oxidation of trimethylsilyl groups on silica studied by solid-state NMR and FTIR

Suvi Haukka, Andrew Root

The Journal of Physical Chemistry

Materials ScienceInorganic ChemistryChemical EngineeringChemical MeasurementEngineering +10

Dispersion and distribution of titanium species bound to silica from titanium tetrachloride

Suvi Haukka, Eeva Liisa Lakomaa, O. Jylhä, +2

Langmuir

Materials ScienceEngineeringTitanium Dioxide MaterialsAltmetric Attention ScoreSocial Media Presence +5

Film Uniformity in Atomic Layer Deposition

Kai‐Erik Elers, Tom Blomberg, M. Peussa, +3

Chemical Vapor Deposition

Materials ScienceSurface TechnologyEngineeringPhysicsTransition Metal Oxides +9

Alloying in Cu/Pd Nanoparticle Catalysts

Alfons M. Molenbroek, Suvi Haukka, B. Clausen

The Journal of Physical Chemistry B

EngineeringCu/pd Nanoparticle CatalystsMetallic NanomaterialsChemistryNew Application +14

History of atomic layer deposition and its relationship with the American Vacuum Society

Gregory N. Parsons, Jeffrey W. Elam, Steven M. George, +7

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Ald ScienceEngineeringAmerican Vacuum SocietyThin Film Process TechnologyChemistry +18

Atomic Layer Deposition of Silicon Nitride from Bis(<i>tert</i>-butylamino)silane and N₂ Plasma

Harm C. M. Knoops, Eline M. J. Braeken, Koen de Peuter, +4

ACS Applied Materials & Interfaces

Materials ScienceSemiconductorsElectrical EngineeringEngineeringNanoelectronics +13

Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural properties

W.F.A. Besling, Edward Young, Thierry Conard, +9

Journal of Non-Crystalline Solids

Materials EngineeringMaterials ScienceElectrical EngineeringStructural PropertiesEngineering +7