Japanese Journal of Applied Physics · 1995 · 17 citations · 7 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsIii-v SemiconductorsLight-emitting DiodesOptoelectronic DevicesSemiconductor Device MaterialsWide-bandgap SemiconductorsBlue Light-emitting DiodesCarrier ConfinementLight-emitting MaterialsSemiconductor Light-emitting MaterialsUltraviolet Light-emitting Diodes
Partial low-energy electron beam irradiation (LEEBI) treatment was used to fabricate UV/blue light-emitting devices based on column-III nitrides having a directly patterned current confinement structure. The newly developed devices show very low leakage reverse current, stable operation at high pulsed current injection, and strong and narrow violet emission at room temperature.
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Thermal Annealing Effects on P-Type Mg-Doped GaN Films
Shuji Nakamura, Takashi Mukai, Masayuki Senoh et al. · Japanese Journal of Applied Physics · 1992 · 1.1K citations
Hole Compensation Mechanism of P-Type GaN Films
Shuji Nakamura, Naruhito Iwasa, Masayuki Senoh et al. · Japanese Journal of Applied Physics · 1992 · 1.1K citations