Japanese Journal of Applied Physics · 1989 · 2K citations · 6 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsDopingIii-v SemiconductorsP-n JunctionsSemiconductor Device MaterialsSemiconductor PhysicsWide-bandgap SemiconductorsConductionElectron Beam Irradiation EffectsGallium NitrideHall EffectHall Effect MeasurementsHole TransportP-type ConductivityP-type Doping
Distinct p-type conduction is realized with Mg-doped GaN by the low-energy electron-beam irradiation (LEEBI) treatment, and the properties of the GaN p-n junction LED are reported for the first time. It was found that the LEEBI treatment drastically lowers the resistivity and remarkably enhances the PL efficiency of MOVPE-grown Mg-doped GaN. The Hall effect measurement of this Mg-doped GaN treated with LEEBI at room temperature showed that the hole concentration is ∼2·10 16 cm -3 , the hole mobility is ∼8 cm 2 /V·s and the resistivity is ∼35 Ω·cm. The p-n junction LED using Mg-doped GaN treated with LEEBI as the p-type material showed strong near-band-edge emission due to the hole injection from the p-layer to the n-layer at room temperature.
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High pressure solution growth of GaN
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Electron beam effects on blue luminescence of zinc-doped GaN
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