Ultra thin silicon nitride films on Si(100) studied with core level photoemission

Making silicon nitride film a viable gate dielectric

T.P. Ma · IEEE Transactions on Electron Devices · 1998 · 383 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reliability limits for the gate insulator in CMOS technology

J. H. Stathis · IBM Journal of Research and Development · 2002 · 230 citations

Engineering, Electrical Engineering, Materials Science +17

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G. Lucovsky, Yongping Wu, H. Niimi et al. · Applied Physics Letters · 1999 · 165 citations

Engineering, Materials Engineering, Materials Science +17

Nitridation of Silicon and Oxidized‐Silicon

Yoshinori Hayafuji, Kazuo Kajiwara · Journal of The Electrochemical Society · 1982 · 121 citations

Natural Sciences, Materials Engineering, Materials Science +17

Surface and interface structures of epitaxial silicon nitride on Si(111)

Jeong Won Kim, Han Woong Yeom · Physical review. B, Condensed matter · 2003 · 64 citations

Natural Sciences, Materials Engineering, Materials Science +17