Concepedia

Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films

S. Schiller, U. Heisig, K. Steinfelder, J. Strümpfel

Thin Solid Films · 1979 · 63 citations · 10 references

DOI

Concepts

References

10

Substrate heating in cylindrical magnetron sputtering sources

John A. Thornton · Thin Solid Films · 1978 · 207 citations

, , +8

Reactive sputtering of metals in oxidizing atmospheres

Johannes Heller · Thin Solid Films · 1973 · 148 citations

, , +8

Use of the ring gap plasmatron for high rate sputtering

S. Schiller, U. Heisig, K. Goedicke · Thin Solid Films · 1977 · 48 citations

, , +10

Magnetron dc reactive sputtering of titanium nitride and indium–tin oxide

Peter Clarke · Journal of Vacuum Science and Technology · 1977 · 43 citations

, , +15

Advances in high rate sputtering with magnetron-plasmatron processing and instrumentation

S. Schiller, U. Heisig, K. Goedicke et al. · Thin Solid Films · 1979 · 43 citations

, , +14