U. Heisig

Reactive d.c. high-rate sputtering as production technology

S. Schiller, U. Heisig, Chr. Korndörfer et al. · Surface and Coatings Technology · 1987 · 116 citations

Engineering, Production Technology, Industrial Engineering +5

Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films

S. Schiller, U. Heisig, K. Steinfelder et al. · Thin Solid Films · 1979 · 63 citations

Materials Science, Materials Engineering, Engineering +9

Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering

Peter Frach, U. Heisig, Chr. Gottfried et al. · Surface and Coatings Technology · 1993 · 61 citations

Materials Engineering, Materials Science, Aluminium Nitride +9

On the investigation of d.c. plasmatron discharges by optical emission spectrometry

S. Schiller, U. Heisig, K. Steinfelder et al. · Thin Solid Films · 1982 · 55 citations

Physics, D.c. Plasmatron Discharges, Spectroscopy +5

Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering

S. Schiller, U. Heisig, G. Beister et al. · Thin Solid Films · 1984 · 53 citations

Materials Science, Thermal Spray Coating, Tribological Coating +7