Reactive d.c. high-rate sputtering as production technology

Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings

John A. Thornton · Journal of Vacuum Science and Technology · 1974 · 2.3K citations

Engineering, Apparatus Geometry, Deposition Conditions +16

Titanium aluminum nitride films: A new alternative to TiN coatings

Wolf‐Dieter Münz · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 942 citations

Sodium Chloride, Crystal Structure, Aluminium Nitride +19

Activated Reactive Evaporation Process for High Rate Deposition of Compounds

R.F. Bunshah, AC Raghuram · Journal of Vacuum Science and Technology · 1972 · 194 citations

Materials Science, High Rate Deposition, Chemical Engineering +13

Mechanisms of voltage controlled, reactive, planar magnetron sputtering of Al in Ar/N2 and Ar/O2 atmospheres

John Affinito, R. R. Parsons · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 116 citations

Aluminium Nitride, Magnetism, Electrical Engineering +15

A high rate sputtering process for the formation of hard friction-reducing TiN coatings on tools

W.‐D. Münz, D. Hoffmann, K. Hartig · Thin Solid Films · 1982 · 112 citations

Materials Science, Materials Engineering, Tribological Coating +9