S. Schiller

Pulsed magnetron sputter technology

S. Schiller, K. Goedicke, J. Reschke et al. · Surface and Coatings Technology · 1993 · 334 citations

Magnetism, Engineering, Applied Physics +4

Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

S. Schiller, G. Beister, William K. Sieber · Thin Solid Films · 1984 · 145 citations

Materials Science, Materials Engineering, Material Analysis +10

Reactive d.c. high-rate sputtering as production technology

S. Schiller, U. Heisig, Chr. Korndörfer et al. · Surface and Coatings Technology · 1987 · 116 citations

Engineering, Production Technology, Industrial Engineering +5

Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering

S. Schiller, G. Beister, William K. Sieber et al. · Thin Solid Films · 1981 · 99 citations

Materials Science, Materials Engineering, Structural Properties +11

Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films

S. Schiller, U. Heisig, K. Steinfelder et al. · Thin Solid Films · 1979 · 63 citations

Materials Science, Materials Engineering, Engineering +9