Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

Applications of TiN thin films in silicon device technology

M. Wittmer, H. Melchior · Thin Solid Films · 1982 · 155 citations

Engineering, Applied Physics, Tin Thin Films +5

Color of titanium nitride prepared by reactive dc magnetron sputtering

Asad Mumtaz, W. H. Class · Journal of Vacuum Science and Technology · 1982 · 104 citations

Engineering, Auger Analysis, Cubic Boron Nitride +18

Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering

S. Schiller, G. Beister, William K. Sieber et al. · Thin Solid Films · 1981 · 99 citations

Materials Science, Materials Engineering, Structural Properties +11

The influence of ion sputtering on the elemental analysis of solid surfaces

J. W. Coburn · Thin Solid Films · 1979 · 96 citations

Materials Science, Materials Engineering, Surface Characterization +9

The effects of substrate bias on the structural and electrical properties of TiN films prepared by reactive r.f. sputtering

Yasuhiro Igasaki, Hiroji Mitsuhashi · Thin Solid Films · 1980 · 95 citations

Materials Science, Materials Engineering, Tin Films +10