Chr. Gottfried

Statistics

Publications

Citations

223

H-Index

Active since

1993

Affiliations

Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology(Current)

Chr. Gottfried is an author at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology specializing in natural sciences, materials science, and materials engineering.

Publications per year

1993–2007

Publications

Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering

Peter Frach, U. Heisig, Chr. Gottfried et al. · Surface and Coatings Technology · 1993 · 61 citations

Natural Sciences, Materials Engineering, Materials Science +15

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

Daniel Glöß, Peter Frach, O. Zywitzki et al. · Surface and Coatings Technology · 2005 · 43 citations

Natural Sciences, Materials Engineering, Materials Science +15

Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties

Daniel Glöß, Peter Frach, Chr. Gottfried et al. · Thin Solid Films · 2007 · 29 citations

Natural Sciences, Materials Engineering, Materials Science +14

The double ring magnetron process module —a tool for stationary deposition of metals, insulators and reactive sputtered compounds

Peter Frach, Chr. Gottfried, Hagen Bartzsch et al. · Surface and Coatings Technology · 1997 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +7

A versatile coating tool for reactive in-line sputtering in different pulse modes

Peter Frach, K. Goedicke, Chr. Gottfried et al. · Surface and Coatings Technology · 2001 · 24 citations

Natural Sciences, Materials Engineering, Materials Science +14

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