Daniel Glöß

Statistics

Publications

Citations

573

H-Index

Active since

2003

Affiliations

Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology(Current)

Technische Universität Dresden

Daniel Glöß is an author at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology specializing in thin films, materials engineering, and natural sciences.

Publications per year

2003–2016

Publications

Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering

Hagen Bartzsch, Daniel Glöß, B. Böcher et al. · Surface and Coatings Technology · 2003 · 139 citations

Natural Sciences, Materials Engineering, Materials Science +16

Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

O. Zywitzki, T. Modes, Hagen Sahm et al. · Surface and Coatings Technology · 2004 · 135 citations

Natural Sciences, Materials Engineering, Materials Science +14

Magnetron sputtering of piezoelectric AlN and AlScN thin films and their use in energy harvesting applications

S. Barth, Hagen Bartzsch, Daniel Glöß et al. · Microsystem Technologies · 2016 · 54 citations

Natural Sciences, Materials Engineering, Materials Science +17

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

Daniel Glöß, Peter Frach, O. Zywitzki et al. · Surface and Coatings Technology · 2005 · 43 citations

Natural Sciences, Materials Engineering, Materials Science +15

Electrical insulation properties of sputter‐deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 °C

Hagen Bartzsch, Daniel Glöß, Peter Frach et al. · physica status solidi (a) · 2009 · 41 citations

Natural Sciences, Materials Engineering, Materials Science +17

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