Concepedia

Daniel Glöß

DG

Statistics

Publications

11

Citations

560

H-Index

11

Active since

2003

Affiliations

Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology(Current)

Technische Universität Dresden

Daniel Glöß is an author at Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology specializing in engineering, materials science, and applied physics.

Top concepts

Publications per year

2003–2016

11

Publications

11

Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering

Hagen Bartzsch, Daniel Glöß, B. Böcher et al. · Surface and Coatings Technology · 2003 · 135 citations

, , +10

Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

O. Zywitzki, T. Modes, Hagen Sahm et al. · Surface and Coatings Technology · 2004 · 133 citations

, , +6

Magnetron sputtering of piezoelectric AlN and AlScN thin films and their use in energy harvesting applications

S. Barth, Hagen Bartzsch, Daniel Glöß et al. · Microsystem Technologies · 2016 · 49 citations

, , +10

Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature

Daniel Glöß, Peter Frach, O. Zywitzki et al. · Surface and Coatings Technology · 2005 · 43 citations

, , +7

Electrical insulation properties of sputter‐deposited SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub> and Al<sub>2</sub>O<sub>3</sub> films at room temperature and 400 °C

Hagen Bartzsch, Daniel Glöß, Peter Frach et al. · physica status solidi (a) · 2009 · 41 citations

, , +15

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