Theoretical Study on Relationship between Acid Generation Efficiency and Acid Generator Concentration in Chemically Amplified Extreme Ultraviolet Resists

Abstract

Understanding of the relationship between acid generation efficiency and acid generator concentration is important for the process and material design. In this study, the relationship was clarified by a Monte Carlo simulation. Using the obtained relationship, the dose dependence of acid generation and the depth profile of acid distribution were calculated. It was found that the acid generator concentration of >20 wt % is required within the sensitivity range of 20–30 mJ cm-2 for the fine patterning of chemically amplified extreme ultraviolet resists.