Concepedia

Properties of ZrO2 thin films prepared by laser ablation

I. Vrejoiu, Dan Matei, M. Morar, G. Epurescu, Aldo Ferrari, M. Balucani, G. Lamedica, Gheorghe Dinescu, C. Grigoriu, M. Dinescu

Materials Science in Semiconductor Processing · 2002 · 13 citations · 19 references

DOI

Concepts

References

19

High-κ gate dielectrics: Current status and materials properties considerations

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2001 · 5.9K citations

, , +17

Alternative dielectrics to silicon dioxide for memory and logic devices

Angus I. Kingon, Jon‐Paul Maria, S. K. Streiffer · Nature · 2000 · 1.3K citations

, , +14

Hafnium and zirconium silicates for advanced gate dielectrics

G. D. Wilk, Robert M. Wallace, J. Anthony · Journal of Applied Physics · 2000 · 972 citations

, , +17

Structure and stability of ultrathin zirconium oxide layers on Si(001)

M. Copel, M. Gribelyuk, Evgeni Gusev · Applied Physics Letters · 2000 · 667 citations

, , +17

Intermixing at the tantalum oxide/silicon interface in gate dielectric structures

G. B. Alers, D. J. Werder, Yves J. Chabal et al. · Applied Physics Letters · 1998 · 265 citations

, , +17