High rate reactive sputtering using gas pulsing: a technique for the creation of films onto large, flat substrates

The formation and control of direct current magnetron discharges for the high-rate reactive processing of thin films

R.P. Howson, A.G. Spencer, K. Oka et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 80 citations

Natural Sciences, Materials Engineering, Materials Science +17

Pressure stability in reactive magnetron sputtering

A.G. Spencer, R.P. Howson, R Lewin · Thin Solid Films · 1988 · 60 citations

Natural Sciences, Materials Science, Physics +9

Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering

S. Schiller, U. Heisig, G. Beister et al. · Thin Solid Films · 1984 · 53 citations

Natural Sciences, Materials Engineering, Materials Science +14

High-rate aluminum oxide deposition by MetaModeTM reactive sputtering

John P. Lehan, R. Sargent, R. E. Klinger · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reactive sputtering with an unbalanced magnetron

R.P. Howson, HA Ja'fer · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +14