Reactive Deposition is a thin-film deposition technique in which a metallic or elemental target material is deposited in the presence of a reactive gas, leading to the in-situ formation of a compound thin film through chemical reaction at the substrate surface.
356
Publications
15.4K
Citations
1.3K
Authors
386
Institutions
Publications per year
2017–2026
35
Parents
Publications
356
Synthesis of Novel Thin-Film Materials by Pulsed Laser Deposition
D. H. Lowndes, David B. Geohegan, Alexander A. Puretzky et al. · Science · 1996 · 634 citations
Natural Sciences, Materials Engineering, Materials Science +15
1–5 of 356
Authors
1.3K
- TS
16
h-index
- FH
15
h-index
- AC
7
h-index
- CR
7
h-index
- SP
7
h-index
1–5 of 1.3K
Institutions
386
University of Tsukuba
Tsukuba, Japan
16 h-index
75 publications
3.1K citations
Uppsala University
Uppsala, Sweden
11 h-index
40 publications
2.8K citations
Linköping University
Linköping, Sweden
8 h-index
27 publications
2.3K citations
University of Illinois Urbana-Champaign
Urbana, United States
7 h-index
18 publications
1.1K citations
Tsinghua University
Beijing, China
7 h-index
27 publications
1K citations
University of Wisconsin–Milwaukee
Milwaukee, United States
7 h-index
20 publications
1.1K citations
University of Essex
Colchester, United Kingdom
7 h-index
20 publications
551 citations
Centre National de la Recherche Scientifique
Paris, France
7 h-index
18 publications
356 citations
1–8 of 386
Venues
- Journal of Applied Physics
28 publications · 1.2K citations
19
h-index
- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
28 publications · 1.3K citations
19
h-index
- Surface and Coatings Technology
24 publications · 910 citations
19
h-index
- Thin Solid Films
28 publications · 1.9K citations
18
h-index
- Applied Physics Letters
23 publications · 879 citations
18
h-index
1–5