Concepedia

Pressure stability in reactive magnetron sputtering

A.G. Spencer, R.P. Howson, R Lewin

Thin Solid Films · 1988 · 60 citations · 7 references

DOI

Concepts

References

7

Modeling of reactive sputtering of compound materials

S. Berg, Hans‐Olof Blom, T. Larsson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 373 citations

, , +13

Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode

S. Schiller, G. Beister, William K. Sieber · Thin Solid Films · 1984 · 145 citations

, , +17

Hysteresis effect in reactive sputtering: a problem of system stability

S. Kadlec, J. Musil, H Vyskocil · Journal of Physics D Applied Physics · 1986 · 77 citations

, , +9

Reactive high rate d.c. sputtering of oxides

Michael Scherer, P. Wirz · Thin Solid Films · 1984 · 44 citations

, , +11

Titanium carbide thin films obtained by reactive magnetron sputtering

Grigor L. Georgiev, N. Feschiev, D. Popov et al. · Vacuum · 1986 · 37 citations

, , +14