High-rate aluminum oxide deposition by MetaModeTM reactive sputtering

Abstract

MetaModeTM reactive sputtering was employed to produce optical quality aluminum oxide films at rates an order of magnitude higher than those possible with conventional reactive magnetron sputtering. System pressure, reactive-to-nonreactive gas flow ratio, and ion-source current density were varied to investigate their effects on rate, process stability, and film properties. It was found that the coatings deposited at a reduced pressure (0.27 Pa) produced dense, water-free coatings without compromising optical quality or deposition rate.