A new approach to fabricating high density nanoarrays by nanocontact printing

Abstract

We introduce a new scheme of nanocontact printing that fabricates nanoarrays using stamps generated by ultraviolet nanoimprint lithography. Array patterns can be generated by this printing technique in a high-density (number of features per unit area) fashion with a feature size as low as 30 nm and period of 100 nm. Sub-500 nm alignment accuracy for multilayer printing has been obtained using a traditional contact mask aligner. We also demonstrate that we can image a nanoarray labeled by streptavidin by atomic force microscope (AFM).