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Silicon lifetime enhancement by SiNx:H anti-reflective coating deposed by PECVD using SiH4 and N2 reactive gas
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Citations
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References
2012
Year
Materials ScienceEngineeringSurface ScienceApplied PhysicsSilicon Lifetime EnhancementSemiconductor Device FabricationH Anti-reflective CoatingSilicon On InsulatorPlasma EtchingChemical Vapor DepositionProtective Coating
| Year | Citations | |
|---|---|---|
1996 | 1.6K | |
2003 | 309 | |
2009 | 168 | |
1955 | 134 | |
2008 | 122 | |
2001 | 67 | |
Properties of nitrogen doped silicon films deposited by low-pressure chemical vapor deposition from silane and ammonia Pierre Temple‐Boyer, Laurent Jalabert, L. Masarotto, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringOptoelectronic DevicesIntegrated CircuitsSilicon On InsulatorSemiconductors | 2000 | 46 |
2009 | 41 | |
2007 | 38 | |
2010 | 28 |
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