Electron mobility and free-carrier absorption in InP; determination of the compensation ratio

W. Walukiewicz, J. Łagowski, L. Jastrzȩbski, +4

Journal of Applied Physics

SemiconductorsN-type InpOptical MaterialsEngineeringPhysics +12

Optical, structural and electrical properties of device-quality hydrogenated amorphous silicon-nitrogen films deposited by plasma-enhanced chemical vapour deposition

Fabrizio Giorgis, F. Giuliani, Candido Fabrizio Pirri, +6

Philosophical Magazine B

Optical MaterialsEngineeringSilane-ammonia Gas MixturesChemistrySilicon On Insulator +14

A new modular multichamber plasma enhanced chemical vapor deposition system

A. Madan, P. Rava, R.E.I. Schropp, +1

Applied Surface Science

Materials ScienceEngineeringApplied PhysicsPlasma CombustionChemical Vapor Deposition +2

Optoelectronic properties, structure and composition of a-SiC:H films grown in undiluted and H2 diluted silane-methane plasma

A. Desalvo, Fabrizio Giorgis, Candido Fabrizio Pirri, +5

Journal of Applied Physics

EngineeringOptoelectronic DevicesThin Film Process TechnologyChemistrySemiconductors +16

Optical properties of hydrogenated amorphous silicon

F. Demichelis, E. Minetti-Mezzetti, Alberto Tagliaferro, +3

Journal of Applied Physics

Optical MaterialsEngineeringSilicon On InsulatorSemiconductorsOptical Properties +15

The influence of hydrogen dilution on the optoelectronic and structural properties of hydrogenated amorphous silicon carbide films

F. Demichelis, G. Crovini, Candido Fabrizio Pirri, +7

Philosophical Magazine B

EngineeringOptoelectronic DevicesSilicon On InsulatorPhotovoltaicsChemical Engineering +17

Optimization of a-Si1−xCx: H films prepared by ultrahigh vacuum plasma enhanced chemical vapour deposition for electroluminescent devices

F. Demichelis, G. Crovini, Candido Fabrizio Pirri, +5

Thin Solid Films

Materials ScienceEngineeringChemical Vapour DepositionNanotechnologySurface Science +9

Physical properties of undoped and doped hydrogenated amorphous silicon carbide

F. Demichelis, Candido Fabrizio Pirri, E. Tresso, +3

Semiconductor Science and Technology

Materials ScienceMaterials EngineeringElectrical EngineeringSemiconductor DeviceEngineering +13

Inhomogeneity of amorphous silicon thin films from optical transmission and reflection measurements

T. Pisarkiewicz, Tomasz Stapiński, H. Czternastek, +1

Journal of Non-Crystalline Solids

Optical MaterialsEngineeringPhysicsOptical PropertiesOptical Transmission +9

Silicon lifetime enhancement by SiNx:H anti-reflective coating deposed by PECVD using SiH4 and N2 reactive gas

R. Bousbih, Wissem Dimassi, Ikbel Haddadi, +3

Solar Energy

Materials ScienceEngineeringSurface ScienceApplied PhysicsSilicon Lifetime Enhancement +6