Realization of sub-micron patterns on GaAs using a HSQ etching mask

Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

Hideo Namatsu, Yasuo Takahashi, Kenji Yamazaki et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 286 citations

Engineering, Materials Engineering, Materials Science +11

Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography

F.C.M.J.M. van Delft, J. Weterings, A. K. van Langen-Suurling et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 111 citations

Engineering, Materials Engineering, Materials Science +14

Effect of curing temperature on the mechanical properties of hydrogen silsesquioxane thin films

Huey‐Chiang Liou, John Pretzer · Thin Solid Films · 1998 · 100 citations

Natural Sciences, Materials Engineering, Materials Science +13

The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ)

Po‐Tsun Liu, Ting‐Chang Chang, Simon M. Sze et al. · Thin Solid Films · 1998 · 81 citations

Natural Sciences, Chemistry, Physics +10

The structural transformation and properties of spin-on poly(silsesquioxane) films by thermal curing

Wei‐Chih Liu, Chang‐Chung Yang, Wen‐Chang Chen et al. · Journal of Non-Crystalline Solids · 2002 · 78 citations

Natural Sciences, Materials Engineering, Materials Science +16