IEEE Transactions on Electron Devices · 1984 · 28 citations · 13 references
EngineeringElectrical EngineeringPhysicsComputational PhysicsMicroelectronicsSemiconductor DevicesBipolar Junction TransistorsDevice ModelingDevice SimulationMonte Carlo MethodsMonte Carlo SimulationSemiconductor PhysicsBipolar Junction Transistor ModelingBipolar Junction Transistor SimulationDrift-diffusion ModelingField-effect Transistor SimulationMonte Carlo Device SimulationMonte Carlo Electron TransportNumerical Device SimulationSilicon
A new approach is proposed to investigate, the limits of validity of the conventional drift-diffusion equation analysis for modeling bipolar transistor structures containing submicrometer dimensions. The single-particle Monte Carlo method is used for the solution of the Boltzmann equation. An electron velocity overshoot of 1.8 times the static saturation velocity has been found for electrons near the base-collector junction of a silicon device. The effect of this velocity overshoot was calculated to enhance the output collector current and reduce the electron transit time by 5 percent for the device structure considered in this work.
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Current equations for velocity overshoot
K.K. Thornber · IEEE Electron Device Letters · 1982 · 100 citations