Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2005 · 42 citations · 27 references
Natural SciencesMaterials EngineeringMaterials ScienceCondensed Matter PhysicsSurface ScienceThin FilmsPlasma Surface TreatmentPlasma-surface InteractionsThin-film DepositionThin-film MaterialsWide Band Gap SemiconductorsFilm DepositionPlasma DepositionPlasma-enhanced DepositionThin Film Deposition Materials
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation Ling Zheng, Li Ling, Xuefeng Hua, Gottlieb S. Oehrlein, E. A. Hudson; Studies of film deposition in fluorocarbon plasmas employing a small gap structure. J. Vac. Sci. Technol. A 1 July 2005; 23 (4): 634–642. https://doi.org/10.1116/1.1931680 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search
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